SPIE Photomask Technology 2014

Memo

The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry.



Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

+ Mask process correction

Larger Glass, Smaller Fields, and Materials for 450mm

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

+ Interactions with magnifications

+ Impact of stitching for mask making and design

Emerging Mask Technologies

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nano imprint mask making

+ Nano imprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Mask Application

+ Double- and multi-patterning

+ Resolution enhancement techniques and OPC

+ Source/mask optimization

+ Design for manufacturability

+ Patterned media

+ Simulation and modeling

+ Inverse lithography technology

Mask Business

+ Mask manufacturing control

+ Mask shop management

+ Mask management in wafer fabs

+ Business aspects of masks

+ Infrastructure challenges