SPIE Advanced Lithography 2016

Memo

Event: SPIE Advanced Lithography 2016

Dates: 21 - 25 February 2016

Registration: Open –October 2015 Close –February 2016.

Submission Dates: Abstract - 8 September 2015. MSS - 25 January 2016

Venue: San Jose Marriott and San Jose Convention Center, San Jose, California, USA

Venue Address: Convention Center: 150 W San Carlos St, San Jose, CA 95113 – Phone: (408)295-9600

Venue Address: Marriott: 301 S Market St, San Jose, CA 95113 – Phone: (408)280-1300

Web URL: Http://spie.org/SPIE-ADVANCED-LITHOGRAPHY-conference

Exhibition: Advanced Lithography Exhibition 2016

Dates: 23 - 24 February 2016



Logo:



Synopsis / Description:

SPIE Advanced Lithography is the premier conference for the lithography community. For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SPIE Advanced Lithography draws more than 2,300 attendees, 50 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Extreme Ultraviolet (EUV) Lithography

+ Alternative Lithographic Technologies

+ Metrology, Inspection, and Process Control for Microlithography

+ Advances in Patterning Materials and Processes

+ Optical Microlithography

+ Design-Process-Technology Co-optimization for Manufacturability

+ Advanced Etch Technology for Nanopatterning



Exhibition: Advanced Lithography Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.